"Jin-Goo Park"의 두 판 사이의 차이

한양 위키
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1번째 줄: 1번째 줄:
 
* 2019 [[Highly Cited Researcher]]
 
* 2019 [[Highly Cited Researcher]]
 
[[분류:Highly Cited Researcher]]
 
[[분류:Highly Cited Researcher]]
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== Profile==
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* 2015 ~ present Member, The National Academy of Engineering of Korea (NAEK)
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* 2017 ~ present  Director, Environmentally Benign Surface Cleaning ICC
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* 2012 ~ 2014 Vice Dean of Graduate School
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* 2012 ~ 2019 President, Society of International Planrarization/CMP Technology
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* 2009 ~ 2012 Visiting Research Professor, Northeastern University, Boston, MA
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* 2006 ~ present Managing Director and Board Member of Korea Cleaning UGM
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* 2004 ~ 2006 and 2011 ~ 2015 President of Korea CMPUGM
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* 2003 ~ present Program Committee Member, SEMI Korea STS
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* 2002 ~ 2003 Visiting Scholar, Department of Mechanical Industrial and Manufacturing Engineering, Northeastern University, Boston,USA
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* 1992 ~ 1994 Member Technical Staff, TexasInstrument,Dallas,TX
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== Research Topics==
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* Wet Cleaning Processes/Chemicals in Semiconductor and Electronic Materials Fabrication,
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* Chemical Mechanical Planrization, Post CMP Cleaning,
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* Mask and EUV Cleaning,
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* Wettability of Surfaces,
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* Particle/Metallic Adhesion and Removal,
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== Papers==
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* “Study on possible root causes of contamination from an incoming PVA brush during post-CMP cleaning”, Polymer Testing, 2019 https://www.sciencedirect.com/science/article/pii/S0142941819303563
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* “Post-CMP Cleaning of InGaAs Surface for the Removal of Nanoparticle Contaminants for Sub-10nm Device Applications”, ECS J. Solid State Sci. Technol., 2019 https://iopscience.iop.org/article/10.1149/2.0051905jss/meta
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* “Removal of EUV exposed hydrocarbon from Ru capping layer of EUV mask using the mixture of alkaline solutions and organic solvents”, Colloids and Surfaces A, 2018 https://www.sciencedirect.com/science/article/pii/S092777571830582X
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* “Investigation of cu-BTA complex formation during Cu chemical mechanical planarization process”, Applied Surface Science, 2016 https://www.sciencedirect.com/science/article/pii/S0169433216311254
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* “Fabrication of hydrophobic/hydrophilic switchable aluminum surfaceusing poly(N-isopropylacrylamide)”, Progress in Organic Coatings, 2016 https://www.sciencedirect.com/science/article/pii/S0300944016301916
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== Writings==
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* Develoments in surface contamination and cleaning, Volume 9: Methods for Surface Cleaning (2017) ISBN: 978-0-3234-3157-6, Chapter 5. Contamination Removal From UV and EUV Photomasks, 2017 https://books.google.co.kr/books?id=emWfDAAAQBAJ&pg=PR2&dq=978-0-3234-3157-6&hl=ko&sa=X&ved=0ahUKEwjx39rH6tfnAhUjIqYKHYuQD1cQ6AEIKDAA#v=onepage&q=978-0-3234-3157-6&f=false
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* Handbook of Silicon Wafer Cleaning Technolgy, 3rd Ed., ISBN: 978-0-323-51084-4, Chapter 3. Particle Deposition and Adhesion and Chapter 10. Metal Surface Chemical Composition and Morphology, 2018 https://books.google.co.kr/books?id=3JOZDgAAQBAJ&pg=PR4&dq=978-0-323-51084-4&hl=ko&sa=X&ved=0ahUKEwjj69qp6tfnAhWKwZQKHf7AALIQ6AEIKDAA#v=onepage&q=978-0-323-51084-4&f=false
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* Guest Editor, Focus Issue on Chemical Mechanical  Planarization for Sub-10 nm Technologies, ECS Journal of Solid State Science and Technology, 2019
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== Industry-Academia Collaboration==
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* Ebara (Japan), Post CMP Cleaning
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* Samsung Electronics (Korea), Backside particles contamination
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* BASF-Chemetall (USA), Ceria particle removal
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* SKhynix (Korea), IPA impurity control
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== Patens==
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* EUV mask cleansing solution and method of fabrication of the same https://patents.google.com/patent/KR101972212B1/en
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* Cleaning method for PVA brush and that apparatus thereof https://patents.google.com/patent/KR20190033339A/en
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==Contact Information ==
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* 연구실 URL : nempl.net
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* E-mail : jgpark@hanyang.ac.kr

2020년 2월 25일 (화) 12:35 판

Profile

  • 2015 ~ present Member, The National Academy of Engineering of Korea (NAEK)
  • 2017 ~ present Director, Environmentally Benign Surface Cleaning ICC
  • 2012 ~ 2014 Vice Dean of Graduate School
  • 2012 ~ 2019 President, Society of International Planrarization/CMP Technology
  • 2009 ~ 2012 Visiting Research Professor, Northeastern University, Boston, MA
  • 2006 ~ present Managing Director and Board Member of Korea Cleaning UGM
  • 2004 ~ 2006 and 2011 ~ 2015 President of Korea CMPUGM
  • 2003 ~ present Program Committee Member, SEMI Korea STS
  • 2002 ~ 2003 Visiting Scholar, Department of Mechanical Industrial and Manufacturing Engineering, Northeastern University, Boston,USA
  • 1992 ~ 1994 Member Technical Staff, TexasInstrument,Dallas,TX

Research Topics

  • Wet Cleaning Processes/Chemicals in Semiconductor and Electronic Materials Fabrication,
  • Chemical Mechanical Planrization, Post CMP Cleaning,
  • Mask and EUV Cleaning,
  • Wettability of Surfaces,
  • Particle/Metallic Adhesion and Removal,

Papers

Writings

Industry-Academia Collaboration

  • Ebara (Japan), Post CMP Cleaning
  • Samsung Electronics (Korea), Backside particles contamination
  • BASF-Chemetall (USA), Ceria particle removal
  • SKhynix (Korea), IPA impurity control

Patens

Contact Information

  • 연구실 URL : nempl.net
  • E-mail : jgpark@hanyang.ac.kr
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