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* 2019 [[Highly Cited Researcher연구우수교수]][[분류:Highly Cited Researcher연구우수교수]]== Profile==* 2015 ~ present Member, The National Academy of Engineering of Korea (NAEK)* 2017 ~ present Director, Environmentally Benign Surface Cleaning ICC* 2012 ~ 2014 Vice Dean of Graduate School* 2012 ~ 2019 President, Society of International Planrarization/CMP Technology* 2009 ~ 2012 Visiting Research Professor, Northeastern University, Boston, MA* 2006 ~ present Managing Director and Board Member of Korea Cleaning UGM* 2004 ~ 2006 and 2011 ~ 2015 President of Korea CMPUGM* 2003 ~ present Program Committee Member, SEMI Korea STS* 2002 ~ 2003 Visiting Scholar, Department of Mechanical Industrial and Manufacturing Engineering, Northeastern University, Boston,USA* 1992 ~ 1994 Member Technical Staff, TexasInstrument,Dallas,TX == Research Topics==* Wet Cleaning Processes/Chemicals in Semiconductor and Electronic Materials Fabrication, * Chemical Mechanical Planrization, Post CMP Cleaning, * Mask and EUV Cleaning, * Wettability of Surfaces, * Particle/Metallic Adhesion and Removal, == Papers==* “Study on possible root causes of contamination from an incoming PVA brush during post-CMP cleaning”, Polymer Testing, 2019 https://www.sciencedirect.com/science/article/pii/S0142941819303563 * “Post-CMP Cleaning of InGaAs Surface for the Removal of Nanoparticle Contaminants for Sub-10nm Device Applications”, ECS J. Solid State Sci. Technol., 2019 https://iopscience.iop.org/article/10.1149/2.0051905jss/meta * “Removal of EUV exposed hydrocarbon from Ru capping layer of EUV mask using the mixture of alkaline solutions and organic solvents”, Colloids and Surfaces A, 2018 https://www.sciencedirect.com/science/article/pii/S092777571830582X * “Investigation of cu-BTA complex formation during Cu chemical mechanical planarization process”, Applied Surface Science, 2016 https://www.sciencedirect.com/science/article/pii/S0169433216311254 * “Fabrication of hydrophobic/hydrophilic switchable aluminum surfaceusing poly(N-isopropylacrylamide)”, Progress in Organic Coatings, 2016 https://www.sciencedirect.com/science/article/pii/S0300944016301916 == Writings== * Develoments in surface contamination and cleaning, Volume 9: Methods for Surface Cleaning (2017) ISBN: 978-0-3234-3157-6, Chapter 5. Contamination Removal From UV and EUV Photomasks, 2017 https://books.google.co.kr/books?id=emWfDAAAQBAJ&pg=PR2&dq=978-0-3234-3157-6&hl=ko&sa=X&ved=0ahUKEwjx39rH6tfnAhUjIqYKHYuQD1cQ6AEIKDAA#v=onepage&q=978-0-3234-3157-6&f=false* Handbook of Silicon Wafer Cleaning Technolgy, 3rd Ed., ISBN: 978-0-323-51084-4, Chapter 3. Particle Deposition and Adhesion and Chapter 10. Metal Surface Chemical Composition and Morphology, 2018 https://books.google.co.kr/books?id=3JOZDgAAQBAJ&pg=PR4&dq=978-0-323-51084-4&hl=ko&sa=X&ved=0ahUKEwjj69qp6tfnAhWKwZQKHf7AALIQ6AEIKDAA#v=onepage&q=978-0-323-51084-4&f=false* Guest Editor, Focus Issue on Chemical Mechanical Planarization for Sub-10 nm Technologies, ECS Journal of Solid State Science and Technology, 2019== Industry-Academia Collaboration==* Ebara (Japan), Post CMP Cleaning* Samsung Electronics (Korea), Backside particles contamination* BASF-Chemetall (USA), Ceria particle removal * SKhynix (Korea), IPA impurity control == Patens==* EUV mask cleansing solution and method of fabrication of the same https://patents.google.com/patent/KR101972212B1/en* Cleaning method for PVA brush and that apparatus thereof https://patents.google.com/patent/KR20190033339A/en ==Contact Information ==* 연구실 URL : http://nempl.net* E-mail : jgpark@hanyang.ac.kr
