Jin-Goo Park

• 2019 Highly Cited Researcher

Profile

• 2015 ~ present Member, The National Academy of Engineering of Korea (NAEK)
• 2017 ~ present Director, Environmentally Benign Surface Cleaning ICC
• 2012 ~ 2014 Vice Dean of Graduate School
• 2012 ~ 2019 President, Society of International Planrarization/CMP Technology
• 2009 ~ 2012 Visiting Research Professor, Northeastern University, Boston, MA
• 2006 ~ present Managing Director and Board Member of Korea Cleaning UGM
• 2004 ~ 2006 and 2011 ~ 2015 President of Korea CMPUGM
• 2003 ~ present Program Committee Member, SEMI Korea STS
• 2002 ~ 2003 Visiting Scholar, Department of Mechanical Industrial and Manufacturing Engineering, Northeastern University, Boston,USA
• 1992 ~ 1994 Member Technical Staff, TexasInstrument,Dallas,TX

Research Topics

• Wet Cleaning Processes/Chemicals in Semiconductor and Electronic Materials Fabrication,
• Chemical Mechanical Planrization, Post CMP Cleaning,
• Mask and EUV Cleaning,
• Wettability of Surfaces,
• Particle/Metallic Adhesion and Removal,

Papers

• “Study on possible root causes of contamination from an incoming PVA brush during post-CMP cleaning”, Polymer Testing, 2019 https://www.sciencedirect.com/science/article/pii/S0142941819303563

• “Post-CMP Cleaning of InGaAs Surface for the Removal of Nanoparticle Contaminants for Sub-10nm Device Applications”, ECS J. Solid State Sci. Technol., 2019 https://iopscience.iop.org/article/10.1149/2.0051905jss/meta

• “Removal of EUV exposed hydrocarbon from Ru capping layer of EUV mask using the mixture of alkaline solutions and organic solvents”, Colloids and Surfaces A, 2018 https://www.sciencedirect.com/science/article/pii/S092777571830582X

• “Investigation of cu-BTA complex formation during Cu chemical mechanical planarization process”, Applied Surface Science, 2016 https://www.sciencedirect.com/science/article/pii/S0169433216311254

• “Fabrication of hydrophobic/hydrophilic switchable aluminum surfaceusing poly(N-isopropylacrylamide)”, Progress in Organic Coatings, 2016 https://www.sciencedirect.com/science/article/pii/S0300944016301916

Writings

• Develoments in surface contamination and cleaning, Volume 9: Methods for Surface Cleaning (2017) ISBN: 978-0-3234-3157-6, Chapter 5. Contamination Removal From UV and EUV Photomasks, 2017 https://books.google.co.kr/books?id=emWfDAAAQBAJ&pg=PR2&dq=978-0-3234-3157-6&hl=ko&sa=X&ved=0ahUKEwjx39rH6tfnAhUjIqYKHYuQD1cQ6AEIKDAA#v=onepage&q=978-0-3234-3157-6&f=false
• Handbook of Silicon Wafer Cleaning Technolgy, 3rd Ed., ISBN: 978-0-323-51084-4, Chapter 3. Particle Deposition and Adhesion and Chapter 10. Metal Surface Chemical Composition and Morphology, 2018 https://books.google.co.kr/books?id=3JOZDgAAQBAJ&pg=PR4&dq=978-0-323-51084-4&hl=ko&sa=X&ved=0ahUKEwjj69qp6tfnAhWKwZQKHf7AALIQ6AEIKDAA#v=onepage&q=978-0-323-51084-4&f=false
• Guest Editor, Focus Issue on Chemical Mechanical Planarization for Sub-10 nm Technologies, ECS Journal of Solid State Science and Technology, 2019

Industry-Academia Collaboration

• Ebara (Japan), Post CMP Cleaning
• Samsung Electronics (Korea), Backside particles contamination
• BASF-Chemetall (USA), Ceria particle removal
• SKhynix (Korea), IPA impurity control

Patens

• EUV mask cleansing solution and method of fabrication of the same https://patents.google.com/patent/KR101972212B1/en
• Cleaning method for PVA brush and that apparatus thereof https://patents.google.com/patent/KR20190033339A/en

Contact Information

• 연구실 URL : http://nempl.net
• E-mail : jgpark@hanyang.ac.kr