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Profile

  • 2015 ~ present Member, The National Academy of Engineering of Korea (NAEK)
  • 2017 ~ present Director, Environmentally Benign Surface Cleaning ICC
  • 2012 ~ 2014 Vice Dean of Graduate School
  • 2012 ~ 2019 President, Society of International Planrarization/CMP Technology
  • 2009 ~ 2012 Visiting Research Professor, Northeastern University, Boston, MA
  • 2006 ~ present Managing Director and Board Member of Korea Cleaning UGM
  • 2004 ~ 2006 and 2011 ~ 2015 President of Korea CMPUGM
  • 2003 ~ present Program Committee Member, SEMI Korea STS
  • 2002 ~ 2003 Visiting Scholar, Department of Mechanical Industrial and Manufacturing Engineering, Northeastern University, Boston,USA
  • 1992 ~ 1994 Member Technical Staff, TexasInstrument,Dallas,TX

Research Topics

  • Wet Cleaning Processes/Chemicals in Semiconductor and Electronic Materials Fabrication,
  • Chemical Mechanical Planrization, Post CMP Cleaning,
  • Mask and EUV Cleaning,
  • Wettability of Surfaces,
  • Particle/Metallic Adhesion and Removal,

Papers

Writings

Industry-Academia Collaboration

  • Ebara (Japan), Post CMP Cleaning
  • Samsung Electronics (Korea), Backside particles contamination
  • BASF-Chemetall (USA), Ceria particle removal
  • SKhynix (Korea), IPA impurity control

Patens

Contact Information

  • 연구실 URL : nempl.net
  • E-mail : jgpark@hanyang.ac.kr